三氯氢硅生产过程中产生的工艺排放气，主要含：

氯硅烷DCS (H2SiCl2), TCS (HSiCl3), STC (SiCl4)

氯化氢（HCl）,H2，N2

Process Vent Gas in TCS Production, mainly includes: DCS, TCS, STC, HCL , H2, N2

特别设计的气液分离管、喷淋塔、文丘里、碱洗塔、水封罐的组合Special designed combination of KO Drum, Spray Tower, Venturi, Caustic Scrubber, Seal Pot.

不易堵塞，全自动Non-clog, Automatic Control

成熟设计Verified Design

多重安全设计Safe Design Considerations

剧烈放热反应Intense Exothermic Reaction

易燃易爆的氢气Explosive H2 Handling

高粘度硅酸盐溶液容易堵塞设备Viscous Silicate Tend to Clog Equipment

防静电设计---至关重要Critical design for Electrostatic charge

碳涂层内衬的pg电子游戏appFRP with Carbon Gel Liner